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磁流体
摘要说明 :
磁流体有液体的流体性质以及固体的磁性。磁流体实际上是悬浮在液体介质中磁性固体的包含颗粒(大约直径10粒径)。为了使他们保持小型,-定要克服磁和范德瓦尔斯相互作用来防止颗粒凝结成块。直径小于10 粒径的磁性微利的热运动由于磁的相互作用,足以防止凝结成块。
示意图
磁流体
基本参数

  A ferrofluid has the fluid properties of a liquid and the magnetic properties of a solid. The ferrofluids actually containtiny particles (around 10 nmdiameter) of a magnetic solid suspended in a liquid medium. To keep them small, magnetic and van der Waals interactions must be overcome to preventthe particles from agglomerating. Thermal motion of magnetite particles smaller than 10 nm in diameter is sufficient to prevent agglomeration due tomagnetic interactions.


    磁流体最初于20世纪69年代在美国国家航空和宇宙航行局研究中心被发现。也就是在那个研究中心,科学家们正研究在太空中控制液体的可能方法,并至今运用到更宽泛的领域。

  Ferrofluids were originally discovered in the 1960s at the NASA Research Center, where scientists were investigating diferent possible methods ofcontrolling liquids in space and applied to wide field at present.


   例如,半导体,液晶显示屏,太阳能电池,高分子发光二极管等。

      For example, Semiconductor, LCD, Solar cell and PLED etc.

  磁流体密封

  Magnetic fluid seal


  磁流体可以作为一个液体0型圈,在这里面一个转轴进入到一个低压或者高压的腔体。磁流体被永磁体固定住,并形成紧密密封,以消除在传统机械密封中产生的大部分的摩擦。

  A frroluid can behave as a liquid 0-ring where a rotating shaft enters either a low- or high-pressure chamber. The ferrofluid is held in place bypermanent magnets and forms a tight seal, eliminating most of the friction produced in a traditional mechanical seal .

  磁流体密封的应用

  Application for magnetic fluid seal


  -.晶圆制造设备

  Wafer growing equipment

  -.半导体工艺设备(外延附生,扩散,化学汽相淀积,物理气相沉积,植入等)

      Semiconductor process equipment (Epitaxy, Difusion, CVD, PVD, Implantation etc)

      -.液晶显示屏工艺设备        -.真空机器人        -.太阳能电池

      LCD process equipment      Vacuum Robot     Solar cell

  

  常见应用规范

  Common Application Specifications


  ●极限真空: 10-6 Pa(10-8托)

  Ultimate vacuum: 10° Pa(10~ 8 Torr)

  ●氦泄漏率:少于1.3x10-12Pa.m3/秒(10-11Torr.I/秒)

  Helium leak rate : Less than 1 3x10 12 Pa.m3/sec(10" Torr-/sec)

      ●压差: 2.5kg/cm2(.5大气)

  Differential pressure : 2.5kg/cm2( .5 atmosphere)

      ●操作温度: 0°C 到200°C (如遇高温,采用冷却系统)

  Operating temperature :0C to 200C ( In case of high temperature should apply to cooling system.,)

      ●气体兼容性:活性气体和反应气体

  Gas compatibility : Active and Reactive Gas

      ●外壳和转轴的材质: SUS303, SUS304, SUS63等

  Materials of housing and shaft : SUS303, SUS304, and SUS630, etc

标准配置
可选配置
设备特性
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